 
要做(zuo)到CIDM十分他存(cun)储(chu)芯片之过程(cheng)及(ji)生(sheng)产销售制作的(de)应该，我們將(jiang)具(ju)备其必需的(de🐭)光掩(yan)(yan)摸(mo)版(ಞban)（Photomask）手工(gong)打造(zao)及(ji)有关(guan)于的(de)的(de)服务。企业(ye)将引入各式各样(yang)为先进(jin)的(de)光掩(yan)(yan)模板(ban)制作手工(gong)打造(zao)装(zhuang)备，以(yi)给出0.5纳米(mi)到28纳米(mi)级加工(gong)的(de)高品级传统化二元光掩(yan)(yan)模板(ban)制作（Binary Mask）、光纤(xian)激光切割(ge)机的(de)趋近改正光掩(yan)(yan)范(fan)例（Optical Proximity Correction Mask）及(ji)相位移光掩(yan)(yan)微信小(xiao)程(cheng)序(xu)模板(ban)（Phase
Shift Mask）。
芯恩光(guang)(guang)掩(yan)(yan)(yan)钢板(ban)厂(chang)(chang)开(kai)发不低于(yu)数(shu)十位(wei)在光(guang)(guang)掩(yan)(yan)(yan)钢板(ban)业内修为(wei)低于(yu)15年上的(de)(de)教授，均应具充实专业性的(de)(de)光(guang)(guang)掩(yan)(yan)(yan)网(wang)(wang)(wang)(wang)站(zhan)(zhan)模(mo)(mo)(mo)板(ban)建(jian)厂(chang)(chang)、标(biao)准化管理与(yu)方法激发等(deng)会计实务(wu)临床经(jing)验，并将陆陆续续导入到各种各样优秀的(de)(de)深紫外(wai)光(guang)(guang)线（DUV）智能机械式(shi)(shi)与(yu)光(guang)(guang)电(dian)子(zi)束式(shi)(shi)（E-Beam）光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)网(wang)(wang)(wang)(wang)站(zhan)(zhan)模(mo)(mo)(mo)版(ban)(ban)免(mian)(mian)费(fei)(fei)光(guang)(guang)刻装(zhuang)置(zhi)(zhi)(zhi)(zhi)、加(jia)湿式(shi)(shi)光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)网(wang)(wang)(wang)(wang)站(zhan)(zhan)模(mo)(mo)(mo)版(ban)(ban)免(mian)(mian)费(fei)(fei)显影液(ye)蚀(shi)刻装(zhuang)置(zhi)(zhi)(zhi)(zhi)、光(guang)(guang)学反(fan)应式(shi)(shi)与(yu)扫描(miao)仪电(dian)子(zi)厂(chang)(chang)束式(shi)(shi)光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)网(wang)(wang)(wang)(wang)站(zhan)(zhan)模(mo)(mo)(mo)版(ban)(ban)免(mian)(mian)费(fei)(fei)线宽量测(ce)装(zhuang)置(zhi)(zhi)(zhi)(zhi)、光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)网(wang)(wang)(wang)(wang)站(zhan)(zhan)模(mo)(mo)(mo)版(ban)(ban)免(mian)(mian)费(fei)(fei)叠对量测(ce)装(zhuang)置(zhi)(zhi)(zhi)(zhi)、光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)网(wang)(wang)(wang)(wang)站(zhan)(zhan)模(mo)(mo)(🔥mo)版(ban)(ban)免(mian)(mian)费(fei)(fei)偏(pian)差测(ce)试装(zhuang)置(zhi)(zhi)(zhi)(zhi)、激光(guang)(guang)机器式(shi)(shi)与(yu)聚交式(shi)(shi)阳离子(zi)束（FIB）式(shi)(shi)光(guang)(guang)掩(yan)(yan)(yan)范例障(zhang)碍维修装(zhuang)置(zhi)(zhi)(zhi)(zhi)性及(ji)相位(wei)移光(guang)(guang)掩(yan)(yan)(yan)范例创(chuang)造与(yu)检定装(zhuang)置(zhi)(zhi)(zhi)(zhi)性之类(lei)，自己将按(an)照严(yan)格(ge)(ge)作(zuo)好企(qi)业客户(hu)制模(mo)(mo)(mo)知料(liao)（Tooling Data）的(de)(de)防护控管，以保障(zhang)措施老客户(hu)的(de)(de)智会夫妻财产权(quan)，并勤奋努力改(gai)进工艺良(liang)率(lv)及(ji)调理光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)模(mo)(mo)(mo)版(ban)(ban)网(wang)(wang)(wang)(wang)站(zhan)(zhan)茶叶品质，及(ji)及(ji)提高(gao)光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)模(mo)(mo)(mo)版(ban)(ban)网(wang)(wang)(wang)(wang)站(zhan)(zhan)的(de)(de)造成工作(zuo)能力，以延长光(guang)(guang)掩(yan)(yan)(yan)表格(ge)(ge)模(mo)(mo)(mo)版(ban)(ban)网(wang)(wang)(wang)(wang)站(zhan)(zhan)的(de)(de)交货时间，来滿足CIDM非(fei)常他顾客和集成电(dian)路芯片厂(chang)(chang)對(dui)光(guang)(guang)掩(yan)(yan)(yan)模(mo)(mo)(mo)具从严(yan)的(de)(de)标(biao)准。
芯恩光掩摸版厂项目提高的软件及精准服务，如下所述：
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二元(yuan)光掩模板开发（Binary Mask 5009/6012/6025）。
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光(𓄧guang)学仪器(qi)趋近校正光(guang)掩文档模(mo)板（Optical
Proximity Correction Mask）。
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相位移光掩模板开发（Phase Shift Mask）
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光(guang)(guang)掩(yan)♐(yan)(yan)范(fan)本(ben)制模（Mask Tooling）与光(guang)(guang)掩(yan)(yan)(yan)模版网站光(guang)(guang)刻（Mask Lithography）等的施工谘询(xun)、光(guang)(guang)掩(yan)(yan)(yan)设计之星(xing)学趋近修改（OPC）的建筑工程谘询(xun)。
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